中文

Macrostructure modeling with microstructure reflectance slices

2021-10-28

United States Patent: 7,129,944. Inventors: Guo; Baining, Lin; Stephen S., Shum; Heung-Yeung, Xu; Ying-Qing, Chen; Yanyun

United States Patent: 7,129,944

Inventors: Guo; Baining, Lin; Stephen S., Shum; Heung-Yeung, Xu; Ying-Qing, Chen; Yanyun

发明人:郭百宁、林思德、沈向洋、徐迎庆、陈彦云


Abstract: A method and system for efficient synthesis of photorealistic free-form knitwear, where a single cross-section of yarn serves as the basic primitive for modeling entire articles of knitwear. This primitive, called the lumislice, describes radiance from a yarn cross-section based on fine-level interactions, including occlusion, shadowing, and multiple scattering, among yarn fibers. By representing yarn as a sequence of identical but rotated cross-sections, the lumislice can effectively propagate local microstructure over arbitrary stitch patterns and knitwear shapes. This framework accommodates varying levels of detail and capitalizes on hardware-assisted transparency blending. To further enhance realism, a technique for generating soft shadows from yarn is also introduced.